- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/20 - Exposure; Apparatus therefor
Patent holdings for IPC class G03F 7/20
Total number of patents in this class: 21121
10-year publication summary
|
1544
|
1684
|
1811
|
1995
|
2157
|
1995
|
1672
|
1752
|
1512
|
302
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 6816 |
3948 |
| Carl Zeiss SMT GmbH | 2646 |
1729 |
| Nikon Corporation | 7162 |
1265 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
1089 |
| FUJIFILM Corporation | 27102 |
971 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
464 |
| Applied Materials, Inc. | 16587 |
389 |
| Canon Inc. | 36841 |
385 |
| ASML Holding N.V. | 542 |
358 |
| KLA-Tencor Corporation | 2574 |
353 |
| Gigaphoton Inc. | 1120 |
332 |
| JSR Corporation | 2476 |
330 |
| Samsung Electronics Co., Ltd. | 131630 |
319 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
299 |
| Tokyo Electron Limited | 11599 |
286 |
| Carl Zeiss SMT AG | 287 |
248 |
| KLA Corporation | 1223 |
198 |
| Boe Technology Group Co., Ltd. | 35384 |
157 |
| Nissan Chemical Corporation | 1725 |
142 |
| International Business Machines Corporation | 60644 |
131 |
| Other owners | 7728 |